Quesada-Gonzalez, M;
Baba, K;
Sotelo-Vazquez, C;
Choquet, P;
Carmalt, CJ;
Parkin, IP;
Boscher, ND;
(2017)
Interstitial Boron-Doped Anatase TiO2 Thin-Film on Optical Fibre: Atmospheric Pressure-Plasma Enhanced Chemical Vapour Deposition as the Key for Functional Oxides Coatings on Temperature-Sensitive Substrates.
Journal of Materials Chemistry A
, 5
(22)
pp. 10836-10842.
10.1039/C7TA02029E.
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Abstract
Temperature sensitive poly(methyl methacrylate) (PMMA) optical fibres were coated with boron doped-anatase crystalline TiO2 thin films in a one-step atmospheric pressure-plasma enhanced chemical vapour deposition (AP-PECVD) process. Both the undoped and interstitial boron-doped TiO2 thin films showed photoactivity under UV irradiation, with the boron-doped thin films presenting higher photodegradation rates when compared to the undoped samples.
| Type: | Article |
|---|---|
| Title: | Interstitial Boron-Doped Anatase TiO2 Thin-Film on Optical Fibre: Atmospheric Pressure-Plasma Enhanced Chemical Vapour Deposition as the Key for Functional Oxides Coatings on Temperature-Sensitive Substrates |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1039/C7TA02029E |
| Publisher version: | http://doi.org/10.1039/C7TA02029E |
| Language: | English |
| Additional information: | This journal is © The Royal Society of Chemistry 2017. Open Access Article. This article is licensed under a Creative Commons Attribution 3.0 Unported Licence |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry |
| URI: | https://discovery.ucl.ac.uk/id/eprint/1558986 |
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