Holmes, SN;
Gough, J;
Chen, C;
Ritchie, DA;
Pepper, M;
(2022)
Variable range hopping conductivity in molecular beam epitaxial InSb.
Journal of Physics D: Applied Physics
, 55
(46)
, Article 46LT01. 10.1088/1361-6463/ac941c.
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Abstract
A variable range hopping (VRH) transport mechanism can be induced in molecular beam epitaxial, n-type doped InSb wafers with focussed Ga+ ion beam damage. This technique allows areas of wafer to be selectively damaged and then subsequently processed into gated metal–insulator–semiconductor (MIS) devices where a disordered, two-dimensional (2D) device can be established. At high levels of damage (dose >1016 Ga+ ions cm−2) amorphous crystalline behavior results with activated conductivity characteristic of a three-dimensional system with VRH below 150 K. At lower doses (1014–1016 Ga+ ions cm−2) a thermally activated conductivity is induced at ∼0.9 K, characteristic of Mott phonon-assisted VRH. At 1 K the devices either conduct with conductivity >∼(e 2/h) where e is the fundamental charge and h is Planck’s constant, or are thermally activated depending on the dose level. The lightly damaged devices show weak antilocalization signals with conductivity characteristic of a 2D electronic system. As the Ga+ dose increases, the measured phase coherence length reduces from ∼500 nm to ∼100 nm. This provides a region of VRH transport where phase-coherent transport processes can be studied in the hopping regime with the dimensionality controlled by a gate voltage in an MIS-device.
| Type: | Article |
|---|---|
| Title: | Variable range hopping conductivity in molecular beam epitaxial InSb |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1088/1361-6463/ac941c |
| Publisher version: | https://doi.org/10.1088/1361-6463/ac941c |
| Language: | English |
| Additional information: | This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third-party material in this article are included in the Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ |
| UCL classification: | UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng UCL > Provost and Vice Provost Offices > UCL BEAMS UCL |
| URI: | https://discovery.ucl.ac.uk/id/eprint/10156619 |
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