Schofield, Steven;
Rahman, Talat;
Teplyakov, Andrew;
(2022)
Atomic and molecular functionalisation of technological materials: an introduction to Nanoscale Processes on Semiconductor Surfaces.
Journal of Physics: Condensed Matter
, 34
(21)
, Article 210401. 10.1088/1361-648X/ac5a24.
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| Type: | Article |
|---|---|
| Title: | Atomic and molecular functionalisation of technological materials: an introduction to Nanoscale Processes on Semiconductor Surfaces |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1088/1361-648X/ac5a24 |
| Publisher version: | https://doi.org/10.1088/1361-648X/ac5a24 |
| Language: | English |
| Additional information: | This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions. |
| UCL classification: | UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology UCL > Provost and Vice Provost Offices > UCL BEAMS UCL |
| URI: | https://discovery.ucl.ac.uk/id/eprint/10144314 |
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