Hardy, Amanda Mary Ellen; (2002) Raman microscopy of some thin films produced by atmospheric pressure chemical vapour deposition. Doctoral thesis (Ph.D), UCL (University College London).

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Abstract

Thin films of a variety of oxides, sulfides and oxysulfides has been produced by atmospheric pressure chemical vapour deposition (APCVD). These were all characterised by Raman microscopy. The APCVD reaction of oxovanadium(V) chloride and hydrogen sulfide was studied between 300 - 600 C, with films deposited at 400 - 600 C. EDX results indicate that V2O4S was produced at 400 - 450 C, V2O3S2 at 500 C, V2O2S3 at 550 C and V2O4S at 600 C. This reaction has not been reported previously. Various analytical techniques including Raman microscopy were used to identify the composition of the films deposited in this study. No Raman spectra have been reported for vanadium oxysulfides previously, therefore the Raman results constitute new information about this class of compounds. Vanadium sulfide films were produced by the APCVD reaction of vanadium tetrachloride and hydrogen sulfide. Reactions were performed at temperatures between 300 - 600 C. Films of the following compounds were produced; VS2 at 300 and 350 C, V2S3 at 400, 450 and 500 C, V3S4 at 550 C and VS at 600 C. The films were characterised by EDX, electron microprobe, XPS, XRD, and Raman microscopy. Films were grown from the APCVD reactions of titanium tetrachloride and hydrogen sulfide at 400, 500 and 600 C. The film deposited at 400 C was found to consist of TiS2; films produced at higher temperatures all showed the presence of both TiS2 and TiO2 in the form of anatase. None of the coatings contained TiS3. The coatings were analysed by EDX, XRD and Raman microscopy. No Raman spectra of TiS2 films are known to have been reported previously. In addition a selection of other films was characterised by Raman microscopy including; vanadium oxides, chromium oxide, titanium dioxide and tin/vanadium sulfides and oxysulfides. These results are all presented in this thesis.

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