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Atomic layer deposition of vanadium oxides: process and application review

Prasadam, VP; Bahlawane, N; Mattelaer, F; Rampelberg, G; Detavernier, C; Fang, L; Jiang, Y; ... Papakonstantinou, I; + view all (2019) Atomic layer deposition of vanadium oxides: process and application review. Materials Today Chemistry , 12 pp. 396-423. 10.1016/j.mtchem.2019.03.004. Green open access

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Abstract

Atomic layer deposition (ALD)is a method of choice for the growth of highly conformal thin films with accurately controlled thickness on planar and nanostructured surfaces. These advantages make it pivotal for emerging nanotechnology applications. This review sheds light on the current developments on the ALD of vanadium oxide, which, with proper postdeposition treatment yields a variety of functional and smart oxide phases. The application of vanadium oxide coatings in electrochemical energy storage, microelectronics and smart windows are emphasized.

Type: Article
Title: Atomic layer deposition of vanadium oxides: process and application review
Open access status: An open access version is available from UCL Discovery
DOI: 10.1016/j.mtchem.2019.03.004
Publisher version: https://doi.org/10.1016/j.mtchem.2019.03.004
Language: English
Additional information: This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions.
Keywords: Postdeposition annealing, Energy storage, Lithium ion batteries, Supercapacitors, Smart windows
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
URI: https://discovery.ucl.ac.uk/id/eprint/10083425
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