Prasadam, VP;
Bahlawane, N;
Mattelaer, F;
Rampelberg, G;
Detavernier, C;
Fang, L;
Jiang, Y;
... Papakonstantinou, I; + view all
(2019)
Atomic layer deposition of vanadium oxides: process and application review.
Materials Today Chemistry
, 12
pp. 396-423.
10.1016/j.mtchem.2019.03.004.
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Abstract
Atomic layer deposition (ALD)is a method of choice for the growth of highly conformal thin films with accurately controlled thickness on planar and nanostructured surfaces. These advantages make it pivotal for emerging nanotechnology applications. This review sheds light on the current developments on the ALD of vanadium oxide, which, with proper postdeposition treatment yields a variety of functional and smart oxide phases. The application of vanadium oxide coatings in electrochemical energy storage, microelectronics and smart windows are emphasized.
| Type: | Article |
|---|---|
| Title: | Atomic layer deposition of vanadium oxides: process and application review |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1016/j.mtchem.2019.03.004 |
| Publisher version: | https://doi.org/10.1016/j.mtchem.2019.03.004 |
| Language: | English |
| Additional information: | This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions. |
| Keywords: | Postdeposition annealing, Energy storage, Lithium ion batteries, Supercapacitors, Smart windows |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences |
| URI: | https://discovery.ucl.ac.uk/id/eprint/10083425 |
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