Hicks, M-L;
Pakpour-Tabrizi, AC;
Zuerbig, V;
Kirste, L;
Nebel, C;
Jackman, RB;
(2019)
Optimizing reactive ion etching to remove sub-surface polishing damage on diamond.
Journal of Applied Physics
, 125
(24)
, Article 244502. 10.1063/1.5094751.
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Abstract
Low defect smooth substrates are essential to achieve high quality diamond epitaxial growth and high performance devices. The optimization of the Ar/O2/CF4 reactive ion etching (RIE) plasma treatment for diamond substrate smoothing and its effectiveness to remove subsurface polishing damage are characterized. An O2/CF4 RIE process and the effect of different process parameters (inductively coupled plasma, platen power, and pressure) were initially examined. This process, however, still produced a detrimental effect to surface roughness, with etch pits across the surface of the sample. The addition of argon to the process achieved near-zero surface pit density and reduced roughness by 20%–44% after 6 and 10 μm etching. Iterative high-resolution X-ray diffraction measurements provided a nondestructive tool to examine the effectiveness of polishing damage removal and in this case reduced after removal of 6 μm of material from the surface of the diamond substrate with the smoothing treatment.
| Type: | Article |
|---|---|
| Title: | Optimizing reactive ion etching to remove sub-surface polishing damage on diamond |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1063/1.5094751 |
| Publisher version: | https://doi.org/10.1063/1.5094751 |
| Language: | English |
| Additional information: | This version is the version of record. For information on re-use, please refer to the publisher’s terms and conditions. |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng |
| URI: | https://discovery.ucl.ac.uk/id/eprint/10077144 |
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