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Feature issue introduction: Beyond Thin Films: Photonics with Ultrathin and Atomically Thin Materials

Foteinopoulou, S; Panoiu, NC; Shalaev, VM; Subramania, GS; (2019) Feature issue introduction: Beyond Thin Films: Photonics with Ultrathin and Atomically Thin Materials. [Editorial comment]. Optical Materials Express , 9 (5) pp. 2427-2436. 10.1364/OME.9.002427. Green open access

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Abstract

Rapid advances in nanotechnology have brought about the realization of material films that may comprise only as little as a few atomic layers. For example, semiconductors and metals of sub-10 nm thicknesses have been realized. Then, the graphene paradigm inspired a plethora of other 2D and quasi-2D materials. In this new era, materials have transcended beyond the traditional thin films to a domain of atomic-scale thicknesses, unleashing vast and unexplored possibilities for light-matter interactions. This Optical Materials Express virtual issue features a collection of thirty-five papers aiming to capture the current state-of-the art, trends and open research directions in photonics with ultrathin and atomically thin materials.

Type: Article
Title: Feature issue introduction: Beyond Thin Films: Photonics with Ultrathin and Atomically Thin Materials
Open access status: An open access version is available from UCL Discovery
DOI: 10.1364/OME.9.002427
Publisher version: https://doi.org/10.1364/OME.9.002427
Language: English
Additional information: Copyright © 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement (https://doi.org/10.1364/OA_License_v1).
UCL classification: UCL
UCL > Provost and Vice Provost Offices
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
URI: https://discovery.ucl.ac.uk/id/eprint/10074887
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