Guo, D;
              
      
            
                Jiang, Q;
              
      
            
                Tang, M;
              
      
            
                Chen, S;
              
      
            
                Mazur, YI;
              
      
            
                Maidaniuk, Y;
              
      
            
                Benamara, M;
              
      
            
            
          
      
            
            
          
      
            
            
          
      
            
            
          
      
            
            
            ... Wu, J; + view all
            
          
      
        
        
        
    
  
(2018)
  Two-colour In0.5Ga0.5As quantum dot infrared photodetectors on silicon.
Semiconductor Science and Technology
, 33
       (9)
    
    
    
    , Article 094009.     10.1088/1361-6641/aad83c.
  
  
      
    
  
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Abstract
An InGaAs quantum dot (QD) photodetector is directly grown on a silicon substrate. GaAs-on-Si virtual substrates with a defect density in the order of 106 cm−2 are fabricated by using strained-layer superlattice as dislocation filters. As a result of the high quality virtual substrate, fabrication of QD layer with good structural properties has been achieved, as evidenced by transmission electron microscopy and x-ray diffraction measurements. The InGaAs QD infrared photodetector is then fabricated on the GaAs-on-Si wafer substrate. Dual-band photoresponse is observed at 80 K with two response peaks around 6 and 15 μm.
| Type: | Article | 
|---|---|
| Title: | Two-colour In0.5Ga0.5As quantum dot infrared photodetectors on silicon | 
| Open access status: | An open access version is available from UCL Discovery | 
| DOI: | 10.1088/1361-6641/aad83c | 
| Publisher version: | https://doi.org/10.1088/1361-6641/aad83c | 
| Language: | English | 
| Additional information: | Original content from this work may be used under the terms of the Creative Commons Attribution 3.0 licence (http://creativecommons.org/licenses/by/3.0). Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI. | 
| Keywords: | photodetectors, infrared, silicon, quantum dots, molecular beam epitaxy | 
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng  | 
        
| URI: | https://discovery.ucl.ac.uk/id/eprint/10055368 | 
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