Shelly, CD; See, P; Ireland, J; Romans, EJ; Williams, JM; (2017) Weak link nanobridges as single flux quantum elements. Superconductor Science and Technology , 30 (9) , Article 095013. 10.1088/1361-6668/aa80cd.

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Abstract

This paper investigates the feasibility of using weak link nanobridges as Josephson junction elements for the purpose of creating Josephson circuits. We demonstrate the development of a single-step electron beam lithography procedure to fabricate niobium nanobridges with dimensions down to $40\,\mathrm{nm}\times 100\,\mathrm{nm}$. The single-step process facilitates fabrication that is scalable to complex circuits that require many junctions. We measure the IV-characteristics (IVC) of the nanobridges between temperatures of $4.2$ and $9\,{\rm{K}}$ and find agreement with numerical simulations and the analytical resistively shunted junction (RSJ) model. Furthermore, we investigate the behaviour of the nanobridges under rf irradiation and observe the characteristic microwave-induced Shapiro steps. Our simulated IVC under rf irradiation using both the RSJ model and circuit simulator JSIM are in agreement with the experimental data. As a potential use of nanobridges in circuits requiring many junctions, we investigate the theoretical performance of a nanobridge-based Josephson comparator circuit using JSIM.

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