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Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

Blackman, CS; Carmalt, CJ; O'Neill, SA; Parkin, IP; Apostolico, L; Moloy, KC; (2003) Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine. Applied Surface Science , 211 (1-4) 2 - 5. 10.1016/S0169-4332(03)00263-0. Green open access

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Abstract

Thin films of titanium(III) phosphide (TiP) have been produced from the dual-source atmospheric pressure CVD reaction of TiCl4 and tristrimethylsilylphosphine. Analysis of the films using EDAX, SEM, glancing angle XRD and XPS is presented.

Type: Article
Title: Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine
Open access status: An open access version is available from UCL Discovery
DOI: 10.1016/S0169-4332(03)00263-0
Publisher version: http://dx.doi.org/10.1016/S0169-4332(03)00263-0
Language: English
Additional information: © 2003 Elsevier Science BV
Keywords: CVD, thin film, titanium phosphide, tristrimethylsilylphosphine, TRANSITION-METAL PHOSPHIDES, CRYSTAL-STRUCTURES, FILMS, TEMPERATURE, PRECURSOR, SPECTRA, ROUTES, GLASS, TICL4
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: https://discovery.ucl.ac.uk/id/eprint/143122
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