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Precursor design and impact of structure on the fabrication of materials

Bhide, MA; Mears, KL; Carmalt, CJ; Knapp, CE; (2022) Precursor design and impact of structure on the fabrication of materials. In: Nanomaterials via Single-Source Precursors: Synthesis, Processing and Applications. (pp. 3-53). Elsevier

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Abstract

This chapter summarizes a range of recently published main group and (primarily) first-row d-block precursor complexes that have been employed in the deposition of metal chalcogenide materials via atmosphere-assisted chemical vapor deposition. In particular the rational design of precursors and the chemistry underpinning their performance are our principal focus in this chapter. Ligand design and metal-ligand cooperativity remain especially important and can afford precursors with interesting reactivity and structures, cleaner decomposition, controlled thermal properties, and lower cost. With the ever-expanding field of functional materials, precursor design is a means to facilitate further development and discovery in the deposition of a range of materials.

Type: Book chapter
Title: Precursor design and impact of structure on the fabrication of materials
ISBN-13: 9780128203446
DOI: 10.1016/B978-0-12-820340-8.00014-9
Publisher version: https://doi.org/10.1016/B978-0-12-820340-8.00014-9
Language: English
Additional information: This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions.
Keywords: Precursors, Synthesis, Structural parameter, Geometry, Deposition, Oxides, Sulfides, Selenides, Main group metal precursors, Chemical vapor deposition
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: https://discovery.ucl.ac.uk/id/eprint/10170833
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