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The formation of a Sn monolayer on Ge(1 0 0) studied at the atomic scale

Hofmann, EVS; Scalise, E; Montalenti, F; Stock, TJZ; Schofield, SR; Capellini, G; Miglio, L; ... Klesse, WM; + view all (2021) The formation of a Sn monolayer on Ge(1 0 0) studied at the atomic scale. Applied Surface Science , 561 , Article 149961. 10.1016/j.apsusc.2021.149961. Green open access

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Abstract

The growth of multi-layer germanium-tin (GeSn) quantum wells offers an intriguing pathway towards the integration of lasers in a CMOS platform. An important step in growing high quality quantum well interfaces is the formation of an initial wetting layer. However, key atomic-scale details of this process have not previously been discussed. We use scanning tunneling microscopy combined with density functional theory to study the deposition of Sn on Ge(1 0 0) at room temperature over a coverage range of 0.01 to 1.24 monolayers. We demonstrate the formation of a sub-2% Ge content GeSn wetting layer from three atomic-scale characteristic ad-dimer structural components, and show that small quantities of Sn incorporate into the Ge surface forming two atomic configurations. The ratio of the ad-dimer structures changes with increasing Sn coverage, indicating a change in growth kinetics. At sub-monolayer coverage, the least densely packing ad-dimer structure is most abundant. As the layer closes, forming a two-dimensional wetting layer, the more densely packing ad-dimer structure become dominant. These results demonstrate the capability to form an atomically smooth wetting layer at room temperature, and provide critical atomic-scale insights for the optimization of growth processes of GeSn multi-quantum-wells to meet the quality requirements of optical GeSn-based devices.

Type: Article
Title: The formation of a Sn monolayer on Ge(1 0 0) studied at the atomic scale
Open access status: An open access version is available from UCL Discovery
DOI: 10.1016/j.apsusc.2021.149961
Publisher version: https://doi.org/10.1016/j.apsusc.2021.149961
Language: English
Additional information: © 2021 The Authors. Published by Elsevier B.V. under a Creative Commons license (https://creativecommons.org/licenses/by/4.0/).
Keywords: STM,DFT, GeSn, Wetting layer
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology
URI: https://discovery.ucl.ac.uk/id/eprint/10128453
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