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Simulation of Cycle-to-Cycle Instabilities in SiOx-Based ReRAM Devices Using a Self-Correlated Process with Long-Term Variation

Miranda, E; Mehonic, A; Ng, W; Kenyon, AJ; (2019) Simulation of Cycle-to-Cycle Instabilities in SiOx-Based ReRAM Devices Using a Self-Correlated Process with Long-Term Variation. IEEE Electron Device Letters , 40 (1) pp. 28-31. 10.1109/LED.2018.2883620. Green open access

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Abstract

Cycle-to-cycle (C2C) current variability occurring in ReRAM devices is not only an stochastic feature inherent to electron transport in low dimensional conducting structures but also a consequence of the measurement protocol used to characterize the device evolution during resistance switching. In such latest case, C2C changes depend on the particular arrangement of the ions or vacancies that form the conducting filament spanning the dielectric film. In this work a discrete first order autoregressive model AR(1) with long-term variation is used to represent both the random and the “deterministic” behaviors of the high resistance state current. Simulation of C2C instabilities in SiOx is carried out through the quantum pointcontact model for filamentary electron transport in dielectrics with fluctuating confinement potential barrier height. Simplicity is of utmost importance since the proposed approach is aimed for circuit simulation environments in which complex and timeconsuming computations need to be avoided.

Type: Article
Title: Simulation of Cycle-to-Cycle Instabilities in SiOx-Based ReRAM Devices Using a Self-Correlated Process with Long-Term Variation
Open access status: An open access version is available from UCL Discovery
DOI: 10.1109/LED.2018.2883620
Publisher version: https://doi.org/10.1109/LED.2018.2883620
Language: English
Additional information: This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions.
Keywords: Market research, Resistance, Mathematical model, Integrated circuit modeling, Switches, Electrical resistance measurement, Protocols
UCL classification: UCL
UCL > Provost and Vice Provost Offices
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
URI: https://discovery.ucl.ac.uk/id/eprint/10062672
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