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A noninvasive rf probe for the study of ionization and dissociation processes in technological plasmas

Law, VJ; Kenyon, AJ; Clary, DC; Batty, I; (1999) A noninvasive rf probe for the study of ionization and dissociation processes in technological plasmas. Journal of Applied Physics , 86 (8) 4100 - 4106. 10.1063/1.371334. Green open access

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Abstract

A swept frequency absorbance plasma diagnostic technique for measurement of self-resonance frequency, intrinsic plasma-tool distributed capacitance, radiative energy loss, and effective plasma capacitance is described. The ex situ probe measures the plasma properties independently of all contributions from the plasma-tool and transmission line connection to the rf supply. The technique employs a swept frequency source and a balanced equal ratio arm bridge to measure the frequency response of the plasma tool after the plasma has been extinguished under plasma conjugate matching conditions. The resonant frequency of the combination of capacitances due to plasma-tool geometry (intrinsic capacitance, C-i) and the matching network (C-m) exhibits a shift from the excitation frequency (13.56 MHz) that is dependent on the effective plasma capacitance. Resonance frequency shift data are given for He, Ne, Ar, O-2, N-2, and N2O as a function of both pressure (0.02-0.8 mbar) and incident power (50 and 100 W). This technique allows the differentiation between dissociation and ionization processes within the plasma through a simple noninvasive rf measurement. (C) 1999 American Institute of Physics. [S0021-8979(99)03420-9].

Type: Article
Title: A noninvasive rf probe for the study of ionization and dissociation processes in technological plasmas
Open access status: An open access version is available from UCL Discovery
DOI: 10.1063/1.371334
Publisher version: http://dx.doi.org/10.1063/1.371334
Language: English
Additional information: Copyright 1999 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Law, VJ and Kenyon, AJ and Clary, DC and Batty, I (1999) A noninvasive rf probe for the study of ionization and dissociation processes in technological plasmas. Journal of Applied Physics, 86 (8) 4100 – 4106 and may be found at http://link.aip.org/link/?jap/86/04100
Keywords: REFERENCE CELL, ELECTRICAL CHARACTERIZATION, DISCHARGES, DIAGNOSTICS, IMPEDANCE, SYSTEM
UCL classification: UCL
UCL > Provost and Vice Provost Offices
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
URI: https://discovery.ucl.ac.uk/id/eprint/188727
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