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Interstitial Boron-Doped Anatase TiO2 Thin-Film on Optical Fibre: Atmospheric Pressure-Plasma Enhanced Chemical Vapour Deposition as the Key for Functional Oxides Coatings on Temperature-Sensitive Substrates

Quesada-Gonzalez, M; Baba, K; Sotelo-Vazquez, C; Choquet, P; Carmalt, CJ; Parkin, IP; Boscher, ND; (2017) Interstitial Boron-Doped Anatase TiO2 Thin-Film on Optical Fibre: Atmospheric Pressure-Plasma Enhanced Chemical Vapour Deposition as the Key for Functional Oxides Coatings on Temperature-Sensitive Substrates. Journal of Materials Chemistry A , 5 (22) pp. 10836-10842. 10.1039/C7TA02029E. Green open access

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Abstract

Temperature sensitive poly(methyl methacrylate) (PMMA) optical fibres were coated with boron doped-anatase crystalline TiO2 thin films in a one-step atmospheric pressure-plasma enhanced chemical vapour deposition (AP-PECVD) process. Both the undoped and interstitial boron-doped TiO2 thin films showed photoactivity under UV irradiation, with the boron-doped thin films presenting higher photodegradation rates when compared to the undoped samples.

Type: Article
Title: Interstitial Boron-Doped Anatase TiO2 Thin-Film on Optical Fibre: Atmospheric Pressure-Plasma Enhanced Chemical Vapour Deposition as the Key for Functional Oxides Coatings on Temperature-Sensitive Substrates
Open access status: An open access version is available from UCL Discovery
DOI: 10.1039/C7TA02029E
Publisher version: http://doi.org/10.1039/C7TA02029E
Language: English
Additional information: This journal is © The Royal Society of Chemistry 2017. Open Access Article. This article is licensed under a Creative Commons Attribution 3.0 Unported Licence
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: https://discovery.ucl.ac.uk/id/eprint/1558986
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