Serra, E;
Bawaj, M;
Borrielli, A;
Di Giuseppe, G;
Forte, S;
Kralj, N;
Malossi, N;
... Bonaldi, M; + view all
(2016)
Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications.
AIP Advances
, 6
(6)
, Article 065004. 10.1063/1.4953805.
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Abstract
In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer, where Q values up to 1.3 × 106 were measured at cryogenic temperatures, and in a Fabry-Pérot cavity, where an optical finesse up to 50000 has been observed.
| Type: | Article |
|---|---|
| Title: | Microfabrication of large-area circular high-stress silicon nitride membranes for optomechanical applications |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1063/1.4953805 |
| Publisher version: | http://dx.doi.org/10.1063/1.4953805 |
| Language: | English |
| Additional information: | Copyright © 2016 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). |
| Keywords: | Optical resonators, Silicon, Coupled resonators, Finite element methods, Effective mass |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Physics and Astronomy |
| URI: | https://discovery.ucl.ac.uk/id/eprint/1521586 |
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