Blackburn, B;
Hassan, I;
Zhang, C;
Blackman, C;
Holt, K;
Carmalt, C;
(2016)
Aerosol Assisted Chemical Vapour Deposition Synthesis of Copper(I) Oxide Thin Films for CO₂ Reduction Photocatalysis.
Journal of Nanoscience and Nanotechnology
, 16
(9)
pp. 10112-10116.
10.1166/jnn.2016.12843.
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Abstract
Copper(I) oxide thin films have been deposited on glass using a simple single-step chemical vapour deposition method, utilising commercially available Cu(acac)₂ (acac = acetylacetonato) dissolved in toluene and deposited at 350 °C, which when exposed to air on cooling forms a native protective layer of CuO <10 nm thick. These films are demonstrated to be active for photoelectrochemical reduction of carbon dioxide at −0.6 V versus Ag/AgCl, a potential route for conversion of waste CO₂ to useful organic chemicals, and stable to photocorrosion.
| Type: | Article |
|---|---|
| Title: | Aerosol Assisted Chemical Vapour Deposition Synthesis of Copper(I) Oxide Thin Films for CO₂ Reduction Photocatalysis |
| DOI: | 10.1166/jnn.2016.12843 |
| Publisher version: | http://dx.doi.org/10.1166/jnn.2016.12843 |
| Language: | English |
| Additional information: | This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions. |
| Keywords: | CO₂ Reduction, Copper Oxide, Photocatalysis, Thin Film |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry |
| URI: | https://discovery.ucl.ac.uk/id/eprint/1517634 |
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