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Polyoxometalate Complexes as Precursors to Vanadium-Doped Molybdenum or Tungsten Oxide Thin Films by Means of Aerosol-Assisted Chemical Vapour Deposition

Ponja, SD; Sathasivam, S; Davies, HO; Parkin, IP; Carmalt, CJ; (2016) Polyoxometalate Complexes as Precursors to Vanadium-Doped Molybdenum or Tungsten Oxide Thin Films by Means of Aerosol-Assisted Chemical Vapour Deposition. ChemPlusChem , 81 (3) pp. 307-314. 10.1002/cplu.201500461. Green open access

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Abstract

Aerosol-assisted chemical vapour deposition of substituted polyoxometalates H4[PMo11VO40], H7[PMo8V4O40], [nBu4N]4[PVW11O40] and [nBu4N]5[PV2W10O40] resulted in the formation of vanadium-doped metal oxide thin films. Depositions were carried out at 550°C in methanol or acetonitrile for the POMs that contained molybdenum or tungsten, respectively. The as-deposited films were X-ray amorphous and relatively non-adherent. However, on annealing in air at 600°C, decolourised translucent films that were more mechanically robust were obtained. Films deposited from H4[PMo11VO40] and H7[PMo8V4O40] consisted of V-doped MoO3 in the orthorhombic phase and films from [nBu4N]4[PVW11O40] and [nBu4N]5[PV2W10O40] comprised of monoclinic V-doped WO3. All films were fully characterised by using X-ray photoelectron spectroscopy, energy-dispersive X-ray diffraction, scanning electron microscopy and UV/Vis spectroscopy.

Type: Article
Title: Polyoxometalate Complexes as Precursors to Vanadium-Doped Molybdenum or Tungsten Oxide Thin Films by Means of Aerosol-Assisted Chemical Vapour Deposition
Open access status: An open access version is available from UCL Discovery
DOI: 10.1002/cplu.201500461
Publisher version: http://dx.doi.org/10.1002/cplu.201500461
Language: English
Additional information: This is the peer reviewed version of the following article: Ponja, SD; Sathasivam, S; Davies, HO; Parkin, IP; Carmalt, CJ; (2016) Polyoxometalate Complexes as Precursors to Vanadium-Doped Molybdenum or Tungsten Oxide Thin Films by Means of Aerosol-Assisted Chemical Vapour Deposition. ChemPlusChem, 81 (3) pp. 307-314, which has been published in final form at: http://dx.doi.org/10.1002/cplu.201500461. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving (http://olabout.wiley.com/WileyCDA/Section/id-820227.html#terms).
Keywords: chemical vapor deposition; doping; metal oxides; polyoxometalates; thin films
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: https://discovery.ucl.ac.uk/id/eprint/1474074
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