Knapp, CE;
Carmalt, CJ;
(2016)
Solution based CVD of main group materials.
Chemical Society Reviews
10.1039/C5CS00651A.
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Abstract
This critical review focuses on the solution based chemical vapour deposition (CVD) of main group materials with particular emphasis on their current and potential applications. Deposition of thin films of main group materials, such as metal oxides, sulfides and arsenides, have been researched owing to the array of applications which utilise them including solar cells, transparent conducting oxides (TCOs) and window coatings. Solution based CVD processes, such as aerosol-assisted (AA)CVD have been developed due to their scalability and to overcome the requirement of suitably volatile precursors as the technique relies on the solubility rather than volatility of precursors which vastly extends the range of potentially applicable compounds. An introduction into the applications and precursor requirements of main group materials will be presented first followed by a detailed discussion of their deposition reviewed according to this application. The challenges and prospects for further enabling research in terms of emerging main group materials will be discussed.
Type: | Article |
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Title: | Solution based CVD of main group materials |
Open access status: | An open access version is available from UCL Discovery |
DOI: | 10.1039/C5CS00651A |
Publisher version: | http://dx.doi.org/10.1039/C5CS00651A |
Language: | English |
Additional information: | This article is freely available. This article is licensed under a Creative Commons Attribution 3.0 Unported Licence (CC BY 3.0) history: Received 18 August 2015; Advance Article published 8 October 2015 |
UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry |
URI: | https://discovery.ucl.ac.uk/id/eprint/1474071 |
1. | Germany | 3 |
2. | United States | 3 |
3. | United Kingdom | 2 |
4. | India | 2 |
5. | China | 1 |
6. | France | 1 |
7. | Russian Federation | 1 |
8. | Belgium | 1 |
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