Jeong, H-H;
Mark, AG;
Lee, T-C;
Son, K;
Chen, W;
Alarcón-Correa, M;
Kim, I;
... Fischer, P; + view all
(2015)
Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications.
Advanced Science
, 2
(7)
, Article 1500016. 10.1002/advs.201500016.
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Abstract
A parallel nanolithographic patterning method is presented that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications.
| Type: | Article |
|---|---|
| Title: | Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1002/advs.201500016 |
| Publisher version: | http://dx.doi.org/10.1002/advs.201500016 |
| Language: | English |
| Additional information: | © 2015 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited. |
| Keywords: | block copolymer micelle nanolithography; glancing angle deposition; nanoimprint lithography; nanoparticle lithography; shadow growth physical vapor deposition |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > MAPS Faculty Office UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > MAPS Faculty Office > Institute for Materials Discovery |
| URI: | https://discovery.ucl.ac.uk/id/eprint/1474019 |
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