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Chemical vapour deposition of group Vb metal phosphide thin films

Blackman, CS; Carmalt, CJ; O'Neill, SA; Parkin, IP; Molloy, KC; Apostolico, L; (2003) Chemical vapour deposition of group Vb metal phosphide thin films. J MATER CHEM , 13 (8) 1930 - 1935. 10.1039/b304084b. Green open access

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Abstract

The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl4 or VOCl3 with cyclohexylphosphine at substrate temperatures of 600 degreesC deposits thin films of amorphous vanadium phosphide. The films are black - gold, hard, chemically resistant and conductive. The APCVD reaction of MCl5 (where M = Nb or Ta) with cyclohexylphosphine at 500 - 600 degreesC deposits films of crystalline beta-MP and at 400 degreesC - 450 degreesC amorphous films of stoichiometry MP are formed. The MP films are metallic, conductive, adherent and chemically resistant.

Type: Article
Title: Chemical vapour deposition of group Vb metal phosphide thin films
Open access status: An open access version is available from UCL Discovery
DOI: 10.1039/b304084b
Language: English
Keywords: GLASS, COATINGS, ELECTRON, NITRIDE, CRYSTAL, TICL4, VCL4
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: https://discovery.ucl.ac.uk/id/eprint/143120
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