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Molecular precursor approach to metal oxide and pnictide thin films

Marchand, P; Carmalt, CJ; (2013) Molecular precursor approach to metal oxide and pnictide thin films. COORDINATION CHEMISTRY REVIEWS , 257 (23-24) 3202 - 3221. 10.1016/j.ccr.2013.01.030. Green open access

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Abstract

Molecular precursors for the preparation of main group metal oxide and transition metal pnictide thin films have been developed. This work involves the design and synthesis of single-source precursors that contain all the elements required in the thin film. Design of the ideal precursor presents a significant challenge since they must be volatile, non-toxic and thermally stable. Therefore the precursors have been tailored to give clean, reproducible decomposition leading to high quality thin films with good coverage of the substrate. In this review key aspects of precursor synthesis and thin film deposition developed in our group are described. The range of precursors developed for main group oxides, in particular gallium and indium oxide, are discussed, with the most studied being the donor-functionalized alkoxides of the type [R2M(OR′)]2 (M = Ga, In; R = H, Me, Et; R′ = CH2CH2NMe2, CH2CH2OMe etc.). Preliminary mechanistic studies suggest that monomers are formed in the gas phase via stabilization of the metal centre by the donor atom (N or O). Precursors to transition metal pnictides have also been developed, including guanidinates, imides, phosphine and arsine compounds and an overview of their use in film deposition is given.

Type: Article
Title: Molecular precursor approach to metal oxide and pnictide thin films
Open access status: An open access version is available from UCL Discovery
DOI: 10.1016/j.ccr.2013.01.030
Publisher version: http://dx.doi.org/10.1016/j.ccr.2013.01.030
Additional information: © 2013 Elsevier B.V. All rights reserved. This work is licensed under a Creative Commons Attribution 3.0 Unported License.
Keywords: Gallium oxide, Indium oxide, Single-source precursors, Bismuth oxide, Titanium nitride, Tungsten nitride, Titanium phosphide, Titanium arsenide, Zirconium carbonitride, Chemical vapour deposition
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: https://discovery.ucl.ac.uk/id/eprint/1418932
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