Blackman, CS;
Carmalt, CJ;
Parkin, IP;
O'Neill, SA;
Molloy, KC;
Apostolico, L;
(2003)
Chemical vapour deposition of crystalline thin films of tantalum phosphide.
MATER LETT
, 57
(18)
2634 - 2636.
10.1016/S0167-577X(02)01341-1.
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Abstract
Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.
| Type: | Article |
|---|---|
| Title: | Chemical vapour deposition of crystalline thin films of tantalum phosphide |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1016/S0167-577X(02)01341-1 |
| Language: | English |
| Keywords: | chemical vapour deposition, thin film, tantalum phosphide, barrier layer, hard, chemical resistance, TRANSITION-METAL PHOSPHIDES, PRESSURE, PRECURSOR, ELECTRON, BINARY, ROUTES, GLASS |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry |
| URI: | https://discovery.ucl.ac.uk/id/eprint/1395574 |
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Chemical vapour deposition of crystalline thin films of tantalum phosphide. (deposited 27 Oct 2010 13:19)
- Chemical vapour deposition of crystalline thin films of tantalum phosphide. (deposited 07 Jun 2013 08:46) [Currently Displayed]
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