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Chemical vapour deposition of crystalline thin films of tantalum phosphide

Blackman, CS; Carmalt, CJ; Parkin, IP; O'Neill, SA; Molloy, KC; Apostolico, L; (2003) Chemical vapour deposition of crystalline thin films of tantalum phosphide. MATER LETT , 57 (18) 2634 - 2636. 10.1016/S0167-577X(02)01341-1. Green open access

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Abstract

Tantalum phosphide coatings were prepared by chemical vapour deposition reaction of TaCl5 and PH2Cy at 350-500 degreesC. The films are hard, stable to corrosive environments and show reflection properties in the infrared. (C) 2002 Elsevier Science B.V. All rights reserved.

Type: Article
Title: Chemical vapour deposition of crystalline thin films of tantalum phosphide
Open access status: An open access version is available from UCL Discovery
DOI: 10.1016/S0167-577X(02)01341-1
Language: English
Keywords: chemical vapour deposition, thin film, tantalum phosphide, barrier layer, hard, chemical resistance, TRANSITION-METAL PHOSPHIDES, PRESSURE, PRECURSOR, ELECTRON, BINARY, ROUTES, GLASS
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: https://discovery.ucl.ac.uk/id/eprint/1395574

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