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Low threshold InAs/InP quantum dot lasers on Si

Jia, H; Park, JS; Zeng, H; Yuan, J; Li, J; Wang, Y; Liu, S; ... Liu, H; + view all (2025) Low threshold InAs/InP quantum dot lasers on Si. In: Proceedings of the 2025 IEEE Silicon Photonics Conference (SiPhotonics). IEEE: London, UK. Green open access

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Abstract

We have developed low threshold InP-based L-band quantum (QD) lasers monolithically grown on Si substrates for photonic integration. To overcome the fundamental challenges of growing high-density, high uniformity QDs on InP-based material system, QD thickness in combination with a modified indium flush technique was adopted, resulting in a low threshold current density of 1.35 kA/cm2 and pulsed lasing up to 100 °C. These results represent progress in C-/L-band QD laser development on Si, highlighting the potential for high-performance semiconductor light source for long-haul telecommunication applications.

Type: Proceedings paper
Title: Low threshold InAs/InP quantum dot lasers on Si
Event: 2025 IEEE Silicon Photonics Conference (SiPhotonics)
Dates: 14 Apr 2025 - 17 Apr 2025
ISBN: 979-8-3315-0618-6
Open access status: An open access version is available from UCL Discovery
DOI: 10.1109/SiPhotonics64386.2025.10984482
Publisher version: https://doi.org/10.1109/siphotonics64386.2025.1098...
Language: English
Additional information: This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions.
Keywords: L-band, quantum dots, photonic integration, MBE, telecommunication
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
URI: https://discovery.ucl.ac.uk/id/eprint/10209381
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