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Comparison of nanobridge lithography techniques for novel SQUID devices

Potter, Jamie A; Chapman, Gemma; Godfrey, Tom; Meti, Laith; Bhandari, Parth; Shaforost, Olena; Gallop, John; ... Hao, Ling; + view all (2025) Comparison of nanobridge lithography techniques for novel SQUID devices. IEEE Transactions on Applied Superconductivity 10.1109/tasc.2025.3528908. (In press). Green open access

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Abstract

NanoSQUIDS incorporating nanobridges as the Josephson element are desirable since their small dimensions mean they can be situated in close proximity to very small, highly localised magnetic moments for high spin sensitivity. Key to achieving the necessary dimensions are the lithographic technologies used to fabricate the nanobridges. Here we present characterisation of Nb nanoSQUIDs incorporating nanobridges fabricated by three different techniques: neon focused ion beam (FIB) lithography, gallium FIB lithography and e-beam lithography (EBL). We discuss the critical currents and voltage-current characteristics achieved by each technique at various temperatures for a range of nanobridge widths, and discuss the corresponding nanoSQUID voltage modulation and potential applications.

Type: Article
Title: Comparison of nanobridge lithography techniques for novel SQUID devices
Open access status: An open access version is available from UCL Discovery
DOI: 10.1109/tasc.2025.3528908
Publisher version: https://doi.org/10.1109/tasc.2025.3528908
Language: English
Additional information: This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions.
Keywords: Superconducting Quantum Interference Device (SQUID), nanoSQUID, nanobridge, weak links, focused ion beam (FIB) lithography, electron beam lithography (EBL)
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
URI: https://discovery.ucl.ac.uk/id/eprint/10204126
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