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High-quality germanium growth on (111)-faceted V-groove silicon by molecular beam epitaxy

Mtunzi, Makhayeni; Jia, Hui; Hou, Yaonan; Yu, Xueying; Zeng, Haotian; Yang, Junjie; Yan, Xingzhao; ... Liu, Huiyun; + view all (2024) High-quality germanium growth on (111)-faceted V-groove silicon by molecular beam epitaxy. Journal of Physics D: Applied Physics , 57 (25) , Article 255101. 10.1088/1361-6463/ad31e0. Green open access

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Abstract

High-quality and low-defect-density germanium (Ge) buffer layers on silicon (Si) substrates have long been developed for group IV and III-V devices by suppressing defect propagation during epitaxial growth. This is a crucial step for the development of highly efficient photonic devices on Si substrates. Patterned silicon substrates have increasingly been employed for their ability to restrict and hinder the motion of defects. In this work, we demonstrate the effectiveness of an optimised two-step growth recipe structure on a (111)-faceted V-groove silicon substrate with a 350 nm flat ridge. This strategy succesfully reduces the threading dislocation density while growing a 1 µm Ge buffer layer via molecular beam epitaxy. As a result, a high-quality buffer is produced with a low threading dislocation density on the order of 107 cm-2 and a surface roughness below 1 nm.

Type: Article
Title: High-quality germanium growth on (111)-faceted V-groove silicon by molecular beam epitaxy
Open access status: An open access version is available from UCL Discovery
DOI: 10.1088/1361-6463/ad31e0
Publisher version: http://dx.doi.org/10.1088/1361-6463/ad31e0
Language: English
Additional information: Original content from this work may be used under the terms of the Creative Commons Attribution 4.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.
Keywords: V-groove, Aspect ratio trapping, Annealing
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
URI: https://discovery.ucl.ac.uk/id/eprint/10189677
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