Oh, J; Hoffman, JB; Hong, S; Jo, KD; Roman-Kustas, J; Reed, JH; Dana, CE; ... Miljkovic, N; + view all Oh, J; Hoffman, JB; Hong, S; Jo, KD; Roman-Kustas, J; Reed, JH; Dana, CE; Cropek, DM; Alleyne, M; Miljkovic, N; - view fewer (2020) Dissolvable Template Nanoimprint Lithography: A Facile and Versatile Nanoscale Replication Technique. Nano Letters , 20 (10) pp. 6989-6997. 10.1021/acs.nanolett.0c01547.

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Abstract

Nanoimprinting lithography (NIL) is a next-generation nanofabrication method, capable of replicating nanostructures from original master surfaces. Here, we develop highly scalable, simple, and nondestructive NIL using a dissolvable template. Termed dissolvable template nanoimprinting lithography (DT-NIL), our method utilizes an economic thermoplastic resin to fabricate nanoimprinting templates, which can be easily dissolved in simple organic solvents. We used the DT-NIL method to replicate cicada wings which have surface nanofeatures of ∼100 nm in height. The master, template, and replica surfaces showed a >∼94% similarity based on the measured diameter and height of the nanofeatures. The versatility of DT-NIL was also demonstrated with the replication of re-entrant, multiscale, and hierarchical features on fly wings, as well as hard silicon wafer-based artificial nanostructures. The DT-NIL method can be performed under ambient conditions with inexpensive materials and equipment. Our work opens the door to opportunities for economical and high-throughput nanofabrication processes.

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