Potts, SE;
Van den Elzen, LRJG;
Dingemans, G;
Langereis, E;
Keuning, W;
Goverde, JC;
Hoogeland, D-J;
... Kessels, WMM; + view all
(2009)
Low Temperature Plasma-Enhanced ALD of Metal Oxide Thin Films.
Presented at: 216th Electrochemical Society Meeting, Vienna, Austria.
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Text (Presentation)
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| Type: | Conference item (Presentation) |
|---|---|
| Title: | Low Temperature Plasma-Enhanced ALD of Metal Oxide Thin Films |
| Event: | 216th Electrochemical Society Meeting |
| Location: | Vienna, Austria |
| Dates: | 04 - 09 October 2009 |
| Open access status: | An open access version is available from UCL Discovery |
| Publisher version: | https://www.electrochem.org/216 |
| Language: | English |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry |
| URI: | https://discovery.ucl.ac.uk/id/eprint/10114902 |
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