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Low Temperature Plasma-Enhanced ALD of Metal Oxide Thin Films

Potts, SE; Van den Elzen, LRJG; Dingemans, G; Langereis, E; Keuning, W; Goverde, JC; Hoogeland, D-J; ... Kessels, WMM; + view all (2009) Low Temperature Plasma-Enhanced ALD of Metal Oxide Thin Films. Presented at: 216th Electrochemical Society Meeting, Vienna, Austria. Green open access

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Type: Conference item (Presentation)
Title: Low Temperature Plasma-Enhanced ALD of Metal Oxide Thin Films
Event: 216th Electrochemical Society Meeting
Location: Vienna, Austria
Dates: 04 - 09 October 2009
Open access status: An open access version is available from UCL Discovery
Publisher version: https://www.electrochem.org/216
Language: English
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: https://discovery.ucl.ac.uk/id/eprint/10114902
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