UCL Discovery
UCL home » Library Services » Electronic resources » UCL Discovery

Iron-Intercalated Zirconium Diselenide Thin Films from the Low-Pressure Chemical Vapor Deposition of [Fe(η⁵-C₅H₄Se)₂Zr(η⁵-C₅H₅)₂]₂

Sanchez-Perez, C; Knapp, CE; Colman, RH; Sotelo-Vazquez, C; Sathasivam, S; Oilunkaniemi, R; Laitinen, RS; (2020) Iron-Intercalated Zirconium Diselenide Thin Films from the Low-Pressure Chemical Vapor Deposition of [Fe(η⁵-C₅H₄Se)₂Zr(η⁵-C₅H₅)₂]₂. ACS Omega , 5 (26) pp. 15799-15804. 10.1021/acsomega.0c00413. Green open access

[thumbnail of Article]
Preview
Text (Article)
acsomega.0c00413.pdf - Published Version

Download (2MB) | Preview
[thumbnail of Supporting Information]
Preview
Text (Supporting Information)
ao0c00413_si_001.pdf - Published Version

Download (405kB) | Preview

Abstract

Transition metal chalcogenide thin films of the type FexZrSe2 have applications in electronic devices, but their use is limited by current synthetic techniques. Here, we demonstrate the synthesis and characterization of Fe-intercalated ZrSe2 thin films on quartz substrates using the low-pressure chemical vapor deposition of the single-source precursor [Fe(η5-C5H4Se)2Zr(η5-C5H5)2]2. Powder X-ray diffraction of the film scraping and subsequent Rietveld refinement of the data showed the successful synthesis of the Fe0.14ZrSe2 phase, along with secondary phases of FeSe and ZrO2. Upon intercalation, a small optical band gap enhancement (Eg(direct)opt = 1.72 eV) is detected in comparison with that of the host material.

Type: Article
Title: Iron-Intercalated Zirconium Diselenide Thin Films from the Low-Pressure Chemical Vapor Deposition of [Fe(η⁵-C₅H₄Se)₂Zr(η⁵-C₅H₅)₂]₂
Open access status: An open access version is available from UCL Discovery
DOI: 10.1021/acsomega.0c00413
Publisher version: https://doi.org/10.1021/acsomega.0c00413
Language: English
Additional information: This is an open access article published under a Creative Commons Attribution (CC-BY) License (http://pubs.acs.org/page/policy/authorchoice_ccby_termsofuse.html), which permits unrestricted use, distribution and reproduction in any medium, provided the author and source are cited.
Keywords: Thin films, Precursors, Physical and chemical processes, Electrical conductivity, Intercalation
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: https://discovery.ucl.ac.uk/id/eprint/10103546
Downloads since deposit
78Downloads
Download activity - last month
Download activity - last 12 months
Downloads by country - last 12 months

Archive Staff Only

View Item View Item