Coccia, Luigi Gino; (1997) Pulsed laser ablation and deposition of electronic materials. Doctoral thesis (Ph.D.), University College London (United Kingdom).

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Abstract

The technique of pulsed laser deposition (PLD) has been studied since the discovery of the laser over thirty years ago, but following the discovery of superconductivity in complex cuprates at liquid nitrogen temperatures, there has been a concerted effort in many laboratories to further the understanding of this complicated technique. Pulsed laser deposition offers numerous advantages over other thin film techniques including the preservation of target stoichiometry, the possibility of reactive deposition and high growth rates. This thesis concentrates on the analysis of the composition and energy of the ablation plume by energy-dispersive mass spectrometry and on the fabrication of high quality thin films for solid oxide fuel cell applications. In particular, results of energy dispersive mass spectrometric techniques of ablation plasmas from a number of elements and simple compounds are presented. The focus of the work is on the generation and detection of high energy ions within the ablation plume for Copper, Lead and Lead zirconate titanate and the transport of these ions through a background gas, and the possibilities for materials synthesis through gas- phase collisions and reaction. The kinetics of gas-phase oxidation and nitration of laser ablated Titanium and Silicon are compared, and the stability of simple gas phase molecular species produced during the ablation of CeO2, MgO and ZnO is also studied. Finally, the growth of materials for solid oxide fuel cell applications by the pulsed laser deposition technique is presented. New materials for electrolyte and cathode applications are fabricated by PLD, and these may lead to the development of lower operating temperature thin film solid oxide fuel cell structures. Films were analysed by X-ray diffraction. Secondary ion mass spectrometry, Rutherford backscattering spectrometry, Ellipsometry and electrical impedance techniques. The effects of laser fluence, substrate temperature, background gas pressure and laser pulse duration on the quality of deposited films were explored.

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