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Optimization of 1.3 mu m InAs/GaAs quantum dot lasers epitaxially grown on silicon: taking the optical loss of metamorphic epilayers into account

Wang, J; Bai, Y; Liu, H; Cheng, Z; Tang, M; Chen, S; Wu, J; ... Ren, X; + view all (2018) Optimization of 1.3 mu m InAs/GaAs quantum dot lasers epitaxially grown on silicon: taking the optical loss of metamorphic epilayers into account. Laser Physics , 28 (12) , Article 126206. 10.1088/1555-6611/aae194. Green open access

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Abstract

Taking the optical loss caused by the metamorphic layers into account, we have proposed an optimization strategy for 1.3 µm InAs/GaAs quantum dot (QD) laser structures directly grown on silicon. We have investigated the effects of the QD layer number, the thickness and the composition of AlGaAs cladding layers on QD laser performance. The results demonstrate, with respect to the net modal gain and the differential quantum efficiency, that the optimized QD layer number is 7 for lasers grown on silicon, which is different from the optimized number of 5 for the counterparts grown on native substrates. The optimized thickness is obtained for the cladding layers of Al0.4Ga0.6As, Al0.6Ga0.4As and Al0.8Ga0.2As. Further, the optimized QD layer number for the net modal gain is nearly independent of the material gain of active regions. More importantly, the optimization strategy provides a comprehensive method to understand the differences in design between QD laser structures on silicon and those on native substrates.

Type: Article
Title: Optimization of 1.3 mu m InAs/GaAs quantum dot lasers epitaxially grown on silicon: taking the optical loss of metamorphic epilayers into account
Open access status: An open access version is available from UCL Discovery
DOI: 10.1088/1555-6611/aae194
Publisher version: http://dx.doi.org/10.1088/1555-6611/aae194
Language: English
Additional information: This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions.
Keywords: Science & Technology, Physical Sciences, Optics, Physics, Applied, Physics, semiconductor lasers, quantum dot lasers, lasers on silicon, FREE-CARRIER ABSORPTION, MICRO-DISK LASERS, AXIS 001 GAP/SI, SEMICONDUCTOR-LASERS, WELL LASERS, SI, GAIN, LAYER, PERFORMANCE, PHOTONICS
UCL classification: UCL
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
URI: https://discovery.ucl.ac.uk/id/eprint/10059765
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