Sener, ME;
Caruana, DJ;
(2018)
Modulation of copper(I) oxide reduction/oxidation in atmospheric pressure plasma jet.
Electrochemistry Communications
, 95
pp. 38-42.
10.1016/j.elecom.2018.08.014.
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Abstract
We describe the controlled reduction of copper(I) oxide films to metallic copper in a non-thermal, atmospheric pressure, helium plasma jet. Thin layers (≈0.1 μm) of Cu2O are electrochemically deposited onto Pt electrodes and placed in capacitively coupled helium plasma doped with H2, O2 and CH4 gases. Ex situ Raman spectroscopy was used to probe the effect of plasma treatment on the deposited copper oxide layer. We show that application of a static bias voltage to the Pt substrate during plasma exposure can control the rate of reduction of the copper(I) oxide film. We propose that the reduction process is mediated by plasma electrons and controlling the electron flux to the surface can be used as a means to modulate the reduction process.
| Type: | Article |
|---|---|
| Title: | Modulation of copper(I) oxide reduction/oxidation in atmospheric pressure plasma jet |
| Open access status: | An open access version is available from UCL Discovery |
| DOI: | 10.1016/j.elecom.2018.08.014 |
| Publisher version: | https://doi.org/10.1016/j.elecom.2018.08.014 |
| Language: | English |
| Additional information: | This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions. |
| Keywords: | Copper(I) oxide; reduction; atmospheric pressure; plasma jet; gaseous electrode |
| UCL classification: | UCL UCL > Provost and Vice Provost Offices > UCL BEAMS UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry |
| URI: | https://discovery.ucl.ac.uk/id/eprint/10055146 |
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