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Site-controlled fabrication of silicon nanotips by indentation-induced selective etching

Jin, C; Yu, B; Liu, X; Xiao, C; Wang, H; Jiang, S; Wu, J; ... Qian, L; + view all (2017) Site-controlled fabrication of silicon nanotips by indentation-induced selective etching. Applied Surface Science , 425 pp. 227-232. 10.1016/j.apsusc.2017.07.047. Green open access

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Abstract

In the present study, the indentation-induced selective etching approach is proposed to fabricate site-controlled pyramidal nanotips on Si(100) surface. Without any masks, the site-controlled nanofabrication can be realized by nanoindentation and post etching in potassium hydroxide (KOH) solution. The effect of indentation force and etching time on the formation of pyramidal nanotips was investigated. It is found that the height and radius of the pyramidal nanotips increase with the indentation force or etching time, while long-time etching can lead to the collapse of the tips. The formation of pyramidal tips is ascribed to the anisotropic etching of silicon and etching stop of (111) crystal planes in KOH aqueous solution. The capability of this fabrication method was further demonstrated by producing various tip arrays on silicon surface by selective etching of the site-controlled indent patterns, and the maximum height difference of these tips is less than 10 nm. The indentation-induced selective etching provides a new strategy to fabricate well site-controlled tip arrays for multi-probe SPM system, Si nanostructure-based sensors and high-quality information storage.

Type: Article
Title: Site-controlled fabrication of silicon nanotips by indentation-induced selective etching
Open access status: An open access version is available from UCL Discovery
DOI: 10.1016/j.apsusc.2017.07.047
Publisher version: https://doi.org/10.1016/j.apsusc.2017.07.047
Language: English
Additional information: This version is the author accepted manuscript. For information on re-use, please refer to the publisher’s terms and conditions.
Keywords: Indentation-induced selective etching, Nanofabrication, Tip array, Silicon
UCL classification: UCL > Provost and Vice Provost Offices
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
URI: https://discovery.ucl.ac.uk/id/eprint/10036341
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