?url_ver=Z39.88-2004&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.aufirst=HB&rft.au=Profijt%2C+HB&rft.aulast=Profijt&rft.atitle=Plasma-assisted+atomic+layer+deposition%3A+Basics%2C+opportunities%2C+and+challenges&rft.volume=29&rft.title=Journal+of+Vacuum+Science+and+Technology+A%3A+Vacuum%2C+Surfaces+and+Films&rft.date=September+2011&rft.issn=0734-2101&rft.issue=5&rft.genre=article