eprintid: 10196865
rev_number: 8
eprint_status: archive
userid: 699
dir: disk0/10/19/68/65
datestamp: 2024-09-11 12:48:00
lastmod: 2025-02-08 07:10:07
status_changed: 2024-09-11 12:48:00
type: article
metadata_visibility: show
sword_depositor: 699
creators_name: Padovani, A
creators_name: La Torraca, P
creators_name: Strand, J
creators_name: Larcher, L
creators_name: Shluger, AL
title: Dielectric breakdown of oxide films in electronic devices
ispublished: pub
divisions: UCL
divisions: B04
divisions: C06
divisions: F60
keywords: Electrical and electronic engineering, Electronic devices
note: This version is the author accepted manuscript. For information on re-use, please refer to the publisher's terms and conditions.
abstract: Dielectric breakdown is a sudden and catastrophic increase in the conductivity of an insulator caused by electrical stress. It is one of the major reliability issues in electronic devices using insulating films as gate insulators and in energy and memory capacitors. Despite extensive studies, our understanding of the physical mechanisms driving the breakdown process remains incomplete, and atomistic models describing the dielectric breakdown are controversial. This Review surveys the enormous amount of data and knowledge accumulated from experimental and theoretical studies of dielectric breakdown in different insulating materials, focusing on describing phenomenological models and novel computational approaches.
date: 2024-09
date_type: published
publisher: Springer Science and Business Media LLC
official_url: http://dx.doi.org/10.1038/s41578-024-00702-0
oa_status: green
full_text_type: other
language: eng
primo: open
primo_central: open_green
verified: verified_manual
elements_id: 2305421
doi: 10.1038/s41578-024-00702-0
lyricists_name: Shluger, Alexander
lyricists_id: ASHLU39
actors_name: Kalinowski, Damian
actors_id: DKALI47
actors_role: owner
full_text_status: public
publication: Nature Reviews Materials
volume: 9
pagerange: 607-627
citation:        Padovani, A;    La Torraca, P;    Strand, J;    Larcher, L;    Shluger, AL;      (2024)    Dielectric breakdown of oxide films in electronic devices.                   Nature Reviews Materials , 9    pp. 607-627.    10.1038/s41578-024-00702-0 <https://doi.org/10.1038/s41578-024-00702-0>.       Green open access   
 
document_url: https://discovery.ucl.ac.uk/id/eprint/10196865/1/Shluger_Dielectric%20breakdown%20of%20oxide%20films%20in%20electronic%20devices_AAM.pdf