eprintid: 10085187
rev_number: 21
eprint_status: archive
userid: 608
dir: disk0/10/08/51/87
datestamp: 2019-11-07 17:24:32
lastmod: 2021-10-20 23:54:13
status_changed: 2019-11-07 17:24:32
type: article
metadata_visibility: show
creators_name: Hicks, M-L
creators_name: Pakpour-Tabrizi, AC
creators_name: Jackman, RB
title: Diamond Etching Beyond 10 μm with Near-Zero Micromasking
ispublished: pub
divisions: UCL
divisions: B04
divisions: C05
divisions: F46
keywords: Electronic devices
note: © The Author(s) 2019. This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.
abstract: To exploit the exceptional properties of diamond, new high quality fabrication techniques are needed to produce high performing devices. Etching and patterning diamond to depths beyond one micron has proven challenging due to the hardness and chemical resistance of diamond. A new cyclic Ar/O2 - Ar/Cl2 ICP RIE process has been developed to address micromasking issues from the aluminium mask by optimising the proportion of O2 in the plasma and introducing a preferential “cleaning” step. High quality smooth features up to, but not limited to, 10.6 μm were produced with an average etched surface roughness of 0.47 nm at a diamond etch rate of 45 nm/min and 16.9:1 selectivity.
date: 2019-10-30
date_type: published
official_url: https://doi.org/10.1038/s41598-019-51970-8
oa_status: green
full_text_type: pub
language: eng
primo: open
primo_central: open_green
verified: verified_manual
elements_id: 1714889
doi: 10.1038/s41598-019-51970-8
pii: 10.1038/s41598-019-51970-8
lyricists_name: Hicks, Marie-Laure
lyricists_name: Jackman, Richard
lyricists_id: HICKS03
lyricists_id: RBJAC40
actors_name: Kalinowski, Damian
actors_id: DKALI47
actors_role: owner
full_text_status: public
publication: Scientific Reports
volume: 9
article_number: 15619
event_location: England
citation:        Hicks, M-L;    Pakpour-Tabrizi, AC;    Jackman, RB;      (2019)    Diamond Etching Beyond 10 μm with Near-Zero Micromasking.                   Scientific Reports , 9     , Article 15619.  10.1038/s41598-019-51970-8 <https://doi.org/10.1038/s41598-019-51970-8>.       Green open access   
 
document_url: https://discovery.ucl.ac.uk/id/eprint/10085187/1/Jackman_Diamond%20Etching%20Beyond%2010%E2%80%89%CE%BCm%20with%20Near-Zero%20Micromasking_VoR.pdf