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Number of items: 35.

B

Binions, R; Carmalt, CJ; Parkin, IP; (2003) Germanium phosphide coatings from the atmospheric pressure chemical vapour deposition of GeX4 (X = Cl or Br) and PCyc(hex)H(2). POLYHEDRON , 22 (13) 1683 - 1688. 10.1016/S0277-5387(03)00328-0.

Binions, R; Carmalt, CJ; Parkin, IP; (2003) Tin Phosphide Coatings from the Atmospheric Pressure Chemical Vapour Depoaition of SnCl4 and PCychexxH3-x. In: Allendorf, MD and Maury, F and Teyssandier, F, (eds.) (Proceedings) Chemical Vapour Deposition XVI and EuroCVD 14. (pp. pp. 1426-1433). The Electrochemical Society, Inc.: Pennington, New Jersey.

Blackman, CS; Carmalt, CJ; Manning, TD; O'Neill, SA; Parkin, IP; Apostolico, L; Molloy, KC; (2003) Dual-source atmospheric pressure CVD of amorphous molybdenum phosphide films on glass using molybdenum(v) chloride and cyclohexylphosphine. CHEM VAPOR DEPOS , 9 (1) 10 - +.

Blackman, CS; Carmalt, CJ; Manning, TD; O'Neill, SA; Parkin, IP; Apostolico, L; Molloy, KC; (2003) Dual-source atmospheric pressure CVD of amorphous molybdenum phosphide films on glass using molybdenum(v) chloride and cyclohexylphosphine. Chemical Vapor Deposition , 9 (1) pp. 10-13. 10.1002/cvde.200290000.

Blackman, CS; Carmalt, CJ; O'Neill, SA; Parkin, IP; Apostolico, L; Moloy, KC; (2003) Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine. Applied Surface Science , 211 (1-4) 2 - 5. 10.1016/S0169-4332(03)00263-0. Green open access
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Blackman, CS; Carmalt, CJ; O'Neill, SA; Parkin, IP; Molloy, KC; Apostolico, L; (2003) Chemical vapour deposition of group Vb metal phosphide thin films. J MATER CHEM , 13 (8) 1930 - 1935. 10.1039/b304084b. Green open access
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Blackman, CS; Carmalt, CJ; O'Neill, SA; Parkin, IP; Molloy, KC; Apostolico, L; (2003) Titanium Phosphide Coatings From the Atmospheric Pressure CVD Reaction of TiCl4 with PRxH3-x (R = Cyhex; or R = SiMe3 where x-3). In: Allendorf, MD and Maury, F and Teyssandier, F, (eds.) (Proceedings) Chemical Vapour Deposition XVI and EuroCVD 14. (pp. pp. 1387-1394). The Electrochemical Society, Inc.: Pennington, New Jersey.

Blackman, CS; Carmalt, CJ; Parkin, IP; O'Neill, SA; Molloy, KC; Apostolico, L; (2003) Chemical vapour deposition of crystalline thin films of tantalum phosphide. MATER LETT , 57 (18) 2634 - 2636. 10.1016/S0167-577X(02)01341-1. Green open access
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Brook, N; Bulten, H; Closier, J; Galli, D; Gaspar, C; Harris, F; Harrison, K; (2003) LHCb distributed computing and the GRID. In: (Proceedings) 8th International Workshop on Advanced Computing and Analysis Techniques in Physics Research (ACAT 2002). (pp. pp. 334-338). ELSEVIER SCIENCE BV

Brook, N; Bulten, H; Closier, J; Galli, D; Gaspar, C; Harris, F; Harrison, K; (2003) LHCb distributed computing and the grid. In: (Proceedings) 8th International Conference on B-Physics at Hadron Machines. (pp. pp. 126-130). ELSEVIER SCIENCE BV

C

Carmalt, CJ; Dinnage, CW; Parkin, IP; Peters, ES; Molloy, K; Colucci, MA; (2003) The use of hexamethyldisilathiane for the synthesis of transition metal sulfides. POLYHEDRON , 22 (9) 1255 - 1262. 10.1016/S0277-5387(03)00114-1.

Carmalt, CJ; Newport, A; Parkin, IP; Mountford, P; Sealey, AJ; Dubberley, SR; (2003) Synthesis of TiN thin films from titanium imido complexes. J MATER CHEM , 13 (1) 84 - 87. 10.1039/b208271n.

Carmalt, CJ; Parkin, IP; Peters, ES; (2003) Atmospheric pressure chemical vapour deposition of TiS2 thin films on glass. POLYHEDRON , 22 (9) 1263 - 1269. 10.1016/S0277-5387(03)00067-6.

Carmalt, CJ; Parkin, IP; Peters, ES; (2003) Atmospheric pressure chemical vapour deposition of WS2 thin films on glass. POLYHEDRON , 22 (11) 1499 - 1505. 10.1016/S0277-5387(03)00194-3.

Chabanis, G; Parkin, IP; Williams, DE; (2003) A simple equivalent circuit model to represent microstructure effects on the response of semiconducting oxide-based gas sensors. MEAS SCI TECHNOL , 14 (1) 76 - 86.

Cross, WB; Parkin, IP; (2003) Aerosol assisted chemical vapour deposition of tungsten oxide films from polyoxotungstate precursors: active photocatalysts. CHEM COMMUN (14) 1696 - 1697. 10.1039/b303800a.

Cross, WB; Parkin, IP; O'Neill, SA; Williams, PA; Mahon, MF; Molloy, KC; (2003) Tungsten oxide coatings from the aerosol-assisted chemical vapor deposition of W(OAr)(6) (Ar=C6H5, C6H4F-4, C6H3F2-3,4); photocatalytically active gamma-WO3 films. CHEM MATER , 15 (14) 2786 - 2796. 10.1021/cm020390j.

K

Kuznetsov, MV; Borovinskaya, IP; Morozov, Y; Parkin, IP; (2003) SHS off Pure and alkaline-earth substited rare-eath perovskites. In:

Kuznetsov, MV; Busurin, SM; Morozov, YG; Parkin, IP; (2003) Heterogeneous combustion in electrical and magnetic fields: modification of combustion parameters and products. PHYSICAL CHEMISTRY CHEMICAL PHYSICS , 5 (11) 2291 - 2296. 10.1039/b300152k.

Kuznetsov, MV; Morozov, Y; Parkin, IP; (2003) Zero and applied field SHS of Complex oxides in-situ experiments, SEM/EDAX and Mssbauer measurements. In:

Kuznetsov, MV; Morozov, YG; Parkin, IP; Affleck, L; (2003) Zero and applied field SHS of complex oxides: in-situ experiments, SEM/EDAX and M”ssbauer measurements. In: (Proceedings) Electron Microscopy and Analysis Group Conference 2003. (pp. pp. 7-8).

Kuznetsov, MV; Morozov, YG; Parkin, IP; Kvick, A; (2003) UNSPECIFIED In: (Proceedings) 'SHS reactions in external large magnetic fields: TRXRD experiments, novel microstructure and magnetic properties in ferrites'. In Russian-French Workshop on SHS, Chernogolovka, Russia, 6-8 October.

M

Manning, TD; Parkin, IP; (2003) Tungsten Doped Vanadium Oxide Thin Films by Atmospheric Pressure Chemical Vapour Deposition. In: Allendorf, MD and Maury, F and Teyssandier, F, (eds.) (Proceedings) Chemical Vapour Deposition XVI and EuroCVD 14. (pp. pp. 777-782). The Electrochemical Society, Inc.: Pennington, New Jersey.

Mills, A; Hill, G; Bhopal, S; Parkin, IP; O'Neill, SA; (2003) Thick titanium dioxide films for semiconductor photocatalysis. J PHOTOCH PHOTOBIO A , 160 (3) 185 - 194. 10.1016/S1010-6030(03)00206-5.

Mills, A; Lepre, A; Elliott, N; Bhopal, S; Parkin, IP; O'Neill, SA; (2003) Characterisation of the photocatalyst Pilkington Activ (TM): a reference film photocatalyst? J PHOTOCH PHOTOBIO A , 160 (3) 213 - 224. 10.1016/S1010-6030(03)00205-3.

O

O'Neill, SA; Clark, RJH; Parkin, IP; Elliott, N; Mills, A; (2003) Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate. CHEM MATER , 15 (1) 46 - 50. 10.1021/cm020707f.

O'Neill, SA; Parkin, IP; Clark, RJH; Mills, A; Elliott, N; (2003) Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass. J MATER CHEM , 13 (12) 2952 - 2956. 10.1039/b307768n.

O'Neill, SA; Parkin, IP; Clark, RJH; Mills, A; Elliott, N; (2003) Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass. J MATER CHEM , 13 (1) 56 - 60. 10.1039/b206080a.

P

Pankhurst, QA; Parkin, IP; (2003) Chemical reactions in applied magnetic fields. In: Miller, JS and Drillon, M, (eds.) Magnetism: Molecules to Materials IV. (pp. 467-481). Weinheim: Wiley-VCH

R

Rampaul, A; Parkin, IP; O'Neill, SA; DeSouza, J; Mills, A; Elliott, N; (2003) Titania and tungsten doped titania thin films on glass; active photocatalysts. POLYHEDRON , 22 (1) 35 - 44.

S

Sanderson, KD; Mills, A; Parkin, I; Hurst, S; Lepre, A; McKittrick, I; Rimmer, D; (2003) The Use of Titanium Dioxide Coatings Deposited by APCVD on Glass Substrates to Provide Dual Action and Self Cleaning. In: (pp. pp. 203-208).

Shaw, GA; Parkin, IP; Williams, DE; (2003) Atmospheric pressure chemical vapour deposition of Cr2-xTixO3 (CTO) thin films (<= 3 mu m) on to gas sensing substrates. J MATER CHEM , 13 (12) 2957 - 2962. 10.1039/b308683f.

Spiers, H; Parkin, IP; Pankhurst, QA; Carruana, D; (2003) Thermal imaging studies of SHS - Progression of the synthesis wave by means of heat islands. In:

Spiers, H; Parkin, IP; Pankhurst, QA; Green, M; (2003) Time Resolved X-Ray Diffraction of the SHS of Magnesium Zinc Ferrites (Mg x ZN1-xFe2O3). In:

V

Varnardou, D; Pemble, ME; Sheel, DW; Manning, TD; Parkin, IP; (2003) Characterization of vanadium oxide films prepared by atmospheric pressure chemical vapour deposition. In: Allendorf, MD and Maury, F and Teyssandier, F, (eds.) (Proceedings) Chemical Vapour Deposition XVI and EuroCVD 14. (pp. pp. 1448-1454). The Electrochemical Society, Inc.: Pennington, New Jersey.

This list was generated on Sun Apr 23 03:53:08 2017 BST.