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Modeling of the structure and properties of oxygen vacancies in amorphous silica

Mukhopadhyay, S; Sushko, PV; Stoneham, AM; Shluger, AL; (2004) Modeling of the structure and properties of oxygen vacancies in amorphous silica. PHYS REV B , 70 (19) , Article 195203. 10.1103/PhysRevB.70.195203.

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We used an embedded cluster method to predict and characterize possible structural types of neutral and positively charged oxygen vacancies in amorphous silica. Defects were treated at 70 different oxygen sites of continuous random network amorphous structure generated using classical molecular dynamics. The neutral vacancies are characterized by a wide distribution of formation energies and structural parameters. Our modeling predicts the two major structural types of positively charged vacancies (E-' centers): dimer and dangling bond centers. The local structure of both types of centers depends on the medium range structure of the surrounding amorphous network. The majority of the dangling bond centers are unpuckered. We used structural "fingerprints" derived from similar calculations of oxygen vacancy type centers in quartz and from experiment to find two other structural types of dangling bond centers: the puckered configuration and the back-projected configuration of E-' centers. In each case we find a distribution of both structural and EPR parameters. However, the average values of the EPR parameters for all dangling bond configurations are very similar. The structural criteria which favor the formation of different types of centers in the original amorphous structure are formulated in terms of the average Si-O distance of oxygen ion with its two neighboring silicon ions.

Type: Article
Title: Modeling of the structure and properties of oxygen vacancies in amorphous silica
DOI: 10.1103/PhysRevB.70.195203
UCL classification: UCL > Office of the President and Provost
UCL > School of BEAMS
UCL > School of BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology
URI: http://discovery.ucl.ac.uk/id/eprint/81550
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