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Atmospheric pressure chemical vapour deposition of NbSe2-TiSe2 composite thin films

Boscher, ND; Carmalt, CJ; Parkin, IP; (2010) Atmospheric pressure chemical vapour deposition of NbSe2-TiSe2 composite thin films. APPL SURF SCI , 256 (10) 3178 - 3182. 10.1016/j.apsusc.2009.12.002.

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Abstract

Atmospheric pressure chemical vapour deposition of titanium tetrachloride and niobium pentachloride with di-tert-butyl selenide at 550 degrees C was investigated for different precursors' flow rates. Scanning electron microscopy of the films showed that they were composed of two different kinds of plate-like crystallites. Point wavelength dispersive X-ray (WDX) analyses of the crystallites revealed that they either had the NbSe2 or the TiSe2 composition. The presence of the two phases was confirmed by X-ray diffraction (XRD) and the calculated cell parameters indicate that niobium or titanium was not incorporated into each others' lattice. WDX and XRD analyses highlighted how the NbSe2:TiSe2 ratio in the composite films could be controlled by precursor flow rate. (C) 2009 Elsevier B.V. All rights reserved.

Type:Article
Title:Atmospheric pressure chemical vapour deposition of NbSe2-TiSe2 composite thin films
DOI:10.1016/j.apsusc.2009.12.002
Keywords:CVD, Atmospheric pressure, Metal selenide, Composite film, DICHALCOGENIDES NB(1-X)TI(X)XC(2) XC, MODULATED REACTANTS, DESIGNED SYNTHESIS, SOLID-SOLUTIONS, CVD, GLASS, SUPERLATTICES, SPECTROSCOPY, SYSTEM, GROWTH
UCL classification:UCL > School of BEAMS > Faculty of Maths and Physical Sciences > Chemistry

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