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Low temperature (75<sup>o</sup>C) hydrogenated nanocrystalline silicon films grown by conventional plasma enhanced chemical vapor deposition for thin film transistors

Lee, C-H; Sazonov, A; Nathan, A; (2004) Low temperature (75<sup>o</sup>C) hydrogenated nanocrystalline silicon films grown by conventional plasma enhanced chemical vapor deposition for thin film transistors. Materials Research Society Symposium Proceedings , 808

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Type: Article
Title: Low temperature (75<sup>o</sup>C) hydrogenated nanocrystalline silicon films grown by conventional plasma enhanced chemical vapor deposition for thin film transistors
UCL classification: UCL > School of BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology
URI: http://discovery.ucl.ac.uk/id/eprint/42749
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