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Low temperature (75<sup>o</sup>C) hydrogenated nanocrystalline silicon films grown by conventional plasma enhanced chemical vapor deposition for thin film transistors

Lee, C-H; Sazonov, A; Nathan, A; (2004) Low temperature (75<sup>o</sup>C) hydrogenated nanocrystalline silicon films grown by conventional plasma enhanced chemical vapor deposition for thin film transistors. Materials Research Society Symposium Proceedings , 808

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Type:Article
Title:Low temperature (75<sup>o</sup>C) hydrogenated nanocrystalline silicon films grown by conventional plasma enhanced chemical vapor deposition for thin film transistors
UCL classification:UCL > School of BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology

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