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Surface modification of polyimide with excimer UV radiation at wavelength of 126 nm

Chen, W; Zhang, J; Hu, K; Fang, Q; Boyd, IW; (2004) Surface modification of polyimide with excimer UV radiation at wavelength of 126 nm. Thin Solid Films , 453-454 3 - 6. 10.1016/j.tsf.2003.11.153.

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Abstract

We report the achievement of large area surface modification of polyimide (PI) films by using an excimer lamp at 126 nm. Analysis of the morphology changes and composition of the polymer surface was carried out via SEM, AFM and XPS techniques. SEM and AFM results show that the roughness of the polymer surface increases drastically after a very short UV exposure time, and the morphology change produced by the 126 nm UV lamp is much larger and more efficient than that by 172 nm UV radiation. XPS results suggest that photo-dissociation of imide groups in PI occurs during the 126 nm UV radiation. © 2003 Elsevier B.V. All rights reserved.

Type:Article
Title:Surface modification of polyimide with excimer UV radiation at wavelength of 126 nm
DOI:10.1016/j.tsf.2003.11.153
UCL classification:UCL > School of BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology

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