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Palladium nanoparticles on silicon by photo-reduction using 172 nm excimer UV lamps

Fang, Q; He, G; Cai, WP; Boyd, IW; Zhang, J-Y; (2004) Palladium nanoparticles on silicon by photo-reduction using 172 nm excimer UV lamps. Applied Surface Science , 226 (1-3 SPEC. ISS.) 7 - 11. 10.1016/j.apsusc.2003.12.014.

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Abstract

We report a photochemical procedure induced by ultraviolet (UV) radiation for the preparation of palladium (Pd) nanoparticles on silicon surface at room temperature. Palladium acetate (Pdac, Pd(OCOCH ) ) was used as the precursorwhich was sprayed-on to the Si and irradiated by UV light at a wavelength of 172nm. Scanning electron microscope (SEM), AFM, XRD, and UV-Vis spectroscopy have been used to characterize the as-prepared nanoparticles. The mechanism of growth of Pd particles and the photo-reduction induced by UV radiation are discussed. The effects of precursor concentration, UV-irradiation time, and annealing conditions on the size and distribution of the palladium nanoparticles on Si are also reported. © 2004 Elsevier B.V. All rights reserved.

Type:Article
Title:Palladium nanoparticles on silicon by photo-reduction using 172 nm excimer UV lamps
DOI:10.1016/j.apsusc.2003.12.014
UCL classification:UCL > School of BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology

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