Yu, JJ;
Boyd, IW;
(2004)
Low temperature Si and SiGe oxidation through dielectric barrier discharges.
THIN SOLID FILMS
, 453
pp. 63-66.
10.1016/j.tsf.2003.11.077.
| Type: | Article |
|---|---|
| Title: | Low temperature Si and SiGe oxidation through dielectric barrier discharges |
| Location: | Strasbourg, FRANCE |
| DOI: | 10.1016/j.tsf.2003.11.077 |
| Keywords: | Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, SiGe, oxidation, silicon dioxide, excimer lamps, gate dielectrics, SILICON, MOBILITY, LAYERS, FILMS |
| URI: | http://discovery.ucl.ac.uk/id/eprint/39479 |
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