Kafizas, A and Hyett, G and Parkin, IP (2009) Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film. J MATER CHEM , 19 (10) 1399 - 1408. 10.1039/b817429f.
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Abstract
A novel combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) technique was used to synthesise numerous vanadium oxide and vanadium oxynitride phases on a single film. This is the first example of cAPCVD having been used to synthesise a gradating mixed anion system. The film was characterised by X-ray diffraction (XRD) mapping, Raman, wavelength dispersive X-ray analysis (WDX) and X-ray photoelectron spectroscopy (XPS) analysis of positions along the film's front edge allowed the chemical composition to be determined and correlated with XRD data. Film thicknesses were determined using side-on scanning electron microscopy (SEM). Functional property mapping of the optical transmittance/reflectance and electrical resistance allowed systematic investigation on the effects of oxygen content within a vanadium oxynitride film. cAPCVD used in conjunction with mapping analysis tools is a shortcut for identifying numerous, phases, compositions and properties and their relationships on a single film, and offers a rapid method for analysis of phase-space.
| Type: | Article |
|---|---|
| Title: | Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film |
| DOI: | 10.1039/b817429f |
| Keywords: | TUNGSTEN HEXACHLORIDE, DIOXIDE, GLASS, ACETYLACETONATE, SCATTERING, OXIDATION, COATINGS, VCL4, CVD, ORIENTATION |
| UCL classification: | UCL > School of BEAMS > Faculty of Maths and Physical Sciences > Chemistry |
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