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Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film

Kafizas, A; Hyett, G; Parkin, IP; (2009) Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film. J MATER CHEM , 19 (10) 1399 - 1408. 10.1039/b817429f.

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Abstract

A novel combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) technique was used to synthesise numerous vanadium oxide and vanadium oxynitride phases on a single film. This is the first example of cAPCVD having been used to synthesise a gradating mixed anion system. The film was characterised by X-ray diffraction (XRD) mapping, Raman, wavelength dispersive X-ray analysis (WDX) and X-ray photoelectron spectroscopy (XPS) analysis of positions along the film's front edge allowed the chemical composition to be determined and correlated with XRD data. Film thicknesses were determined using side-on scanning electron microscopy (SEM). Functional property mapping of the optical transmittance/reflectance and electrical resistance allowed systematic investigation on the effects of oxygen content within a vanadium oxynitride film. cAPCVD used in conjunction with mapping analysis tools is a shortcut for identifying numerous, phases, compositions and properties and their relationships on a single film, and offers a rapid method for analysis of phase-space.

Type:Article
Title:Combinatorial atmospheric pressure chemical vapour deposition (cAPCVD) of a mixed vanadium oxide and vanadium oxynitride thin film
DOI:10.1039/b817429f
Keywords:TUNGSTEN HEXACHLORIDE, DIOXIDE, GLASS, ACETYLACETONATE, SCATTERING, OXIDATION, COATINGS, VCL4, CVD, ORIENTATION
UCL classification:UCL > School of BEAMS > Faculty of Maths and Physical Sciences > Chemistry

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