Ultra-violet light activated photocatalysis in thin films of the titanium oxynitride, Ti3-delta O4N.
J PHOTOCH PHOTOBIO A
199 - 203.
A film of the recently reported material Ti3-delta O4N has been shown to be more photocatalytically active than a comparable film of TiO2. The photocatalytic ability was determined using the stearic acid degradation test with 254 nm UV light. Both films were made using atmospheric pressure chemical vapour deposition (APCVD) at 630 C from titanium (IV) chloride and ethyl acetate, with the oxynitride additionally using ammonia as a nitrogen Source. The films were characterised by XRD and spectroscopic methods. The Raman pattern of Ti3-delta O4N is also reported here for the first time. (C) 2009 Elsevier B.V. All rights reserved.
|Title:||Ultra-violet light activated photocatalysis in thin films of the titanium oxynitride, Ti3-delta O4N|
|Keywords:||Photocatalysis, Titanium oxynitirde, Titanium dioxide, Raman, X-ray diffraction, CHEMICAL-VAPOR-DEPOSITION, SEMICONDUCTOR PHOTOCATALYSIS, TIO2, GLASS, WATER, ORIENTATION, APCVD|
|UCL classification:||UCL > School of BEAMS
UCL > School of BEAMS > Faculty of Maths and Physical Sciences
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