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An Investigation of Titanium-Vanadium Nitride Phase Space, Conducted Using Combinatorial Atmospheric Pressure CVD

Hyett, G and Green, MA and Parkin, IP (2008) An Investigation of Titanium-Vanadium Nitride Phase Space, Conducted Using Combinatorial Atmospheric Pressure CVD. CHEM VAPOR DEPOS , 14 (9-10) 309 - 312. 10.1002/cvde.200806705.

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Abstract

The technique of combinatorial atmospheric pressure (AP)CVD, a recent addition to the growing number of combinatorial materials methods, is used to form twelve members of the TixV1-xN alloy series with 0.29 < x < 0.94. This series of compounds has a rock-salt structure with TiN and VN as the end members. The twelve phases, which have potential use as heat mirror coatings, are all synthesized in a single experiment. The structure and properties of the materials are investigated using powder X-ray diffraction (XRD) and electron probe microanalysis (EPMA). The optical properties are considered using visible-IR spectroscopy (IRS), which allows the suitability of the films as solar control coatings to be investigated and optimized as a function of composition.

Type:Article
Title:An Investigation of Titanium-Vanadium Nitride Phase Space, Conducted Using Combinatorial Atmospheric Pressure CVD
DOI:10.1002/cvde.200806705
Keywords:APCVD, Combinatorial, Heat mirror, Titanium nitride, Vanadium nitride, CHEMICAL-VAPOR-DEPOSITION, THIN-FILMS, COMPOSITIONAL SPREADS, COATINGS, OXYNITRIDE, DISCOVERY, FLUID, GLASS
UCL classification:UCL > School of BEAMS > Faculty of Maths and Physical Sciences > Chemistry

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