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N-Doped Titania Thin Films Prepared by Atmospheric Pressure CVD using t-Butylamine as the Nitrogen Source: Enhanced Photocatalytic Activity under Visible Light

Dunnill, CW; Parkin, IP; (2009) N-Doped Titania Thin Films Prepared by Atmospheric Pressure CVD using t-Butylamine as the Nitrogen Source: Enhanced Photocatalytic Activity under Visible Light. CHEM VAPOR DEPOS , 15 (7-9) 171 - +. 10.1002/cvde.200806274.

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Abstract

N-TiO2 prepared by atmospheric pressure chemical vapour deposition shows visible light photocatalysis. This is to our knowledge the first example of an N-doped anatase film with only interstitial doping. The film was prepared using a method that is entirely compatible with industrial processes for producing self-cleaning glass.

Type:Article
Title:N-Doped Titania Thin Films Prepared by Atmospheric Pressure CVD using t-Butylamine as the Nitrogen Source: Enhanced Photocatalytic Activity under Visible Light
DOI:10.1002/cvde.200806274
Keywords:CHEMICAL-VAPOR-DEPOSITION, SEMICONDUCTOR PHOTOCATALYSIS, GLASS, TIO2, DIOXIDE, ORIENTATION, COATINGS, NITRIDE, NH3
UCL classification:UCL > School of BEAMS > Faculty of Maths and Physical Sciences > Chemistry

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