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Remote-coupled Oxygen Plasma Harmonic Measurements for Process Monitoring

Kenyon, AJ; Law, VJ; Bergamini, S; Thornhill, NF; Lee, K; Watkins, M; Lea, L; (2003) Remote-coupled Oxygen Plasma Harmonic Measurements for Process Monitoring. In: Gerard, F, (ed.) Advances in Plasma Physics Research, Vol 4. : New York.

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Type: Book chapter
Title: Remote-coupled Oxygen Plasma Harmonic Measurements for Process Monitoring
Keywords: advances, measurement, MEASUREMENTS, monitoring, Oxygen, Physics, plasma, process, processes, Research
UCL classification: UCL > Provost and Vice Provost Offices
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
URI: http://discovery.ucl.ac.uk/id/eprint/149468
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