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Growth mechanism of planar or nanorod structured tungsten oxide thin films deposited via aerosol assisted chemical vapour deposition (AACVD)

Ling, M; Blackman, C; (2015) Growth mechanism of planar or nanorod structured tungsten oxide thin films deposited via aerosol assisted chemical vapour deposition (AACVD). Physica Status Solidi (C) , 12 (7) pp. 869-877. 10.1002/pssc.201510047. Green open access

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Abstract

Aerosol assisted chemical vapour deposition (AACVD) is used to deposit tungsten oxide thin films from tungsten hexacarbonyl (W(CO)6) at 339 to 358 °C on quartz substrate. The morphologies of as-deposited thin films, which are comprised of two phases (W25O73 and W17O47), vary from planar to nanorod (NR) structures as the distance from the inlet towards the outlet of the reactor is traversed. This is related to variation of the actual temperature on the substrate surface (ΔT = 19 °C), which result in a change in growth mode due to competition between growth rate (perpendicular to substrate) and nucleation rate (parallel to substrate). When the ratio of perpendicular growth rate to growth rate contributed by nucleation is higher than 7.1, the as-deposited tungsten oxide thin film forms as NR. (© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

Type: Article
Title: Growth mechanism of planar or nanorod structured tungsten oxide thin films deposited via aerosol assisted chemical vapour deposition (AACVD)
Open access status: An open access version is available from UCL Discovery
DOI: 10.1002/pssc.201510047
Publisher version: http://dx.doi.org/10.1002/pssc.201510047
Language: English
Additional information: This is the peer reviewed version of the following article: Ling, M; Blackman, C; (2015) Growth mechanism of planar or nanorod structured tungsten oxide thin films deposited via aerosol assisted chemical vapour deposition (AACVD). Physica Status Solidi (C), 12 (7) pp. 869-877, which has been published in final form at: http://dx.doi.org/10.1002/pssc.201510047. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Self-Archiving (http://olabout.wiley.com/WileyCDA/Section/id-820227.html#terms).
Keywords: growth mechanism; aerosol assisted chemical vapour deposition (AACVD); nanorod; tungsten oxide
UCL classification: UCL > Provost and Vice Provost Offices
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Chemistry
URI: http://discovery.ucl.ac.uk/id/eprint/1476540
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