MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water.
J MATER CHEM
7881 - 7886.
Bismuth(III) tert-butoxide [Bi((OBu)-Bu-t)(3)] was utilised as a single-source precursor to controllably deposit thin films of different phases of bismuth oxide (Bi2O3) on glass substrates via low-pressure chemical vapour deposition (LPCVD). Band gaps for the different phases have been measured (E-g = 2.3-3.0 eV) and the films displayed excellent photodegradation of water under near-UV irradiation.
|Title:||MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water|
|Open access status:||An open access version is available from UCL Discovery|
|Keywords:||CHEMICAL-VAPOR-DEPOSITION, INDUCED HYDROGEN-PRODUCTION, TRANSPORT-PROPERTIES, MOLECULAR-STRUCTURE, RAMAN-SPECTROSCOPY, OPTICAL-PROPERTIES, OXIDE-FILMS, SILLENITES, GROWTH, PT/BI2O3/RUO2|
|UCL classification:||UCL > School of BEAMS > Faculty of Maths and Physical Sciences
UCL > School of BEAMS > Faculty of Maths and Physical Sciences > Chemistry
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