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MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water

Moniz, SJA; Blackman, CS; Carmalt, CJ; Hyett, G; (2010) MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water. J MATER CHEM , 20 (36) 7881 - 7886. 10.1039/c0jm01720e. Green open access

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Abstract

Bismuth(III) tert-butoxide [Bi((OBu)-Bu-t)(3)] was utilised as a single-source precursor to controllably deposit thin films of different phases of bismuth oxide (Bi2O3) on glass substrates via low-pressure chemical vapour deposition (LPCVD). Band gaps for the different phases have been measured (E-g = 2.3-3.0 eV) and the films displayed excellent photodegradation of water under near-UV irradiation.

Type:Article
Title:MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water
Open access status:An open access version is available from UCL Discovery
DOI:10.1039/c0jm01720e
Language:English
Keywords:CHEMICAL-VAPOR-DEPOSITION, INDUCED HYDROGEN-PRODUCTION, TRANSPORT-PROPERTIES, MOLECULAR-STRUCTURE, RAMAN-SPECTROSCOPY, OPTICAL-PROPERTIES, OXIDE-FILMS, SILLENITES, GROWTH, PT/BI2O3/RUO2
UCL classification:UCL > School of BEAMS > Faculty of Maths and Physical Sciences > Chemistry

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